Effects of Ni Electrode Thickness on the Dielectric Properties of Nano-scale, RF-Sputtered BaTiO3 Capacitors
Abstract
Nano-scale BaTiO3 capacitors with Ni electrodes were sputtered on Si wafers to determine the effects of electrode thickness on the measured dielectric properties. The BaTiO3 was deposited to a thickness of approximately 150 nm, while the Ni electrodes were deposited at approximately 25, 100, and 230 nm as determined by focused ion beam cross-sectional analysis. All devices were found to have a linear IV response at±1 V that transitioned to a nonlinear mechanism that remained active until the maximum test voltage of±100 V. The IV data also showed the resistances at 1 V decreasing by about 150 GΩ for the 25 nm thick electrodes. Hysteresis plots showed paraelectric behavior for all electrode thicknesses, with measured permittivity ranging from approximately 600 to 1400, with the 100 nm thick electrodes giving the highest permittivity. AC impedance data showed a decrease in permittivity from approximately 1100 to 550 with a decrease in electrode thickness from 230 nm to 100 nm, with losses remaining below 0.10 at 1, 10, and 100 kHz. At 25 nm electrode thickness, the permittivity was found to decrease from about 1050 to 250 and the loss to increase from approximately 0.06 to 0.57 as the test frequency was increased from 1 to 100 kHz. Temperature testing gave activation
Recommended Citation
J. N. Reck et al., "Effects of Ni Electrode Thickness on the Dielectric Properties of Nano-scale, RF-Sputtered BaTiO3 Capacitors," Thin Film Techniques for the Fabrication of Nano-scale High Energy Density Capacitors, Jan 2008.
Department(s)
Materials Science and Engineering
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Publication Date
2008-01-01
