Evidence of Interaction Between Two DX Centers in N-Type AlGaAs from RDLTS and Temperature Dependent Pulse-Width DLTS Measurements
Abstract
Two well-separated electron traps with activation energies: Et ≅ 0.286 eV and Et ≅ 0.433 eV have been consistently detected in the n-type Al0.6Ga0.4As confinement layer of AlGaAs/GaAs single quantum well laser diodes. The physical characteristic parameters for these two traps, including capture cross section, emission time constant, and capture time constant, have been calculated. Reverse-bias pulsed deep level transient spectroscopy (RDLTS) results provide the evidence for the first time that these two traps have strong interaction during emission processes. This allows us to conclude that Et 1 and Et 2 are indeed both donor-unknown centers. Furthermore, using a temperature-dependent pulse-width method, DLTS signals from Et 1 alone can be obtained. The corrected activation energy appears to be a little shallower at Et ≅ 0.265 eV.
Recommended Citation
C. W. Wang et al., "Evidence of Interaction Between Two DX Centers in N-Type AlGaAs from RDLTS and Temperature Dependent Pulse-Width DLTS Measurements," Journal of Electronic Materials, vol. 22, no. 2, pp. 165 - 170, Springer Verlag, Feb 1993.
The definitive version is available at https://doi.org/10.1007/BF02665022
Department(s)
Electrical and Computer Engineering
Sponsor(s)
McDonnell Douglas
Keywords and Phrases
Semiconducting aluminum compounds; Semiconducting gallium arsenide; Semiconductor lasers; Semiconductor quantum wells; Spectroscopy; Substrates; Aluminum gallium arsenide; Reverse bias pulsed deep level transient spectroscopy; Semiconductor devices; Deep level transient spectroscopy (DLTS); Donor-unknown (DX) centers; Interaction
International Standard Serial Number (ISSN)
0361-5235
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 1993 Springer Verlag, All rights reserved.
Publication Date
01 Feb 1993
Comments
This work was supported in part from McDonnell Douglas Missile Systems Company under a contract.