Coatings R&D Notebook

Author

Michael R. Van-De-Mark, Missouri University of Science and TechnologyFollow

Abstract

The views of Dr. Michael R. Van De Mark, University of Missouri--Rolla, on block resistance, dual-cure technologies for UV, DTM coating adhesion factors and operator drawdown deviation are discussed. Block resistance is the tendency of a coating not to adhere to another surface and the solvent evaporation is the key to block resistance. the adhesion in a direct-to-metal (DTM) coatings can be changed by additives such as defoamers, wetting aids, surfactants and dispersants in usually a negative sense. He is of the view that 1-3% of deviation is typically seen between operators for drawdowns.

Recommended Citation

M. R. Van-De-Mark, "Coatings R&D Notebook," Industrial Paint and Powder, Hitchcock Publishing Co., Jan 2003.

Department(s)

Chemistry

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2003 Hitchcock Publishing Co., All rights reserved.

Publication Date

01 Jan 2003