Abstract
The plasma polymerization of tetrafluoroethylene (TFE) is studied in a capacitively coupled system with internal electrodes using radio frequency (13.56 MHz) power. The emphasis is on identifying conditions that are compatible with continuous coating of plasma polymer on a substrate moving through the center of the interelectrode gap. At high pressure (500 mTorr), deposition of plasma polymer is primarily on the electrodes rather than on a substrate placed midway between electrodes. Glow is observed in only part of the interelectrode gap at low powers and fills the gap only at high power levels. The use of a magnetic field effects barely discernible changes. Low‐pressure (below 100 mTorr) operation is more favorable for deposition of a substantial portion of the plasma polymer on a substrate placed midway between electrodes. The plasma polymer deposited at low pressure is characterized by ESCA and deposition rate data and compared to that deposited in an inductively coupled system. The polymers formed in both systems are broadly similar and completely different from conventional poly(TFE). Subtle system‐dependent differences are identified. The known susceptibility of fluorine‐containing polymers (including plasma polymer) to a high‐power plasma has been used as a probe of plasma power density within the interelectrode gap in the capacitively coupled system. Without magnets the most active zone of the plasma is in the center of the interelectrode gap. The use of a magnetic field moves this active zone closer to the electrodes and leads to a more efficient coupling of energy to a polymerizing glow discharge. Copyright © 1979 John Wiley & Sons, Inc.
Recommended Citation
N. C. Morosoff et al., "Plasma Polymerization Of Tetrafluoroethylene. II. Capacitive Radio Frequency Discharge," Journal of Applied Polymer Science, vol. 23, no. 12, pp. 3449 - 3470, Wiley, Jan 1979.
The definitive version is available at https://doi.org/10.1002/app.1979.070231203
Department(s)
Chemical and Biochemical Engineering
Second Department
Chemistry
Publication Status
Full Access
International Standard Serial Number (ISSN)
1097-4628; 0021-8995
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2023 Wiley, All rights reserved.
Publication Date
01 Jan 1979
