Etching MXene using Sulfuric Acid
Department
Chemistry
Major
Biology
Research Advisor
Mochalin, Vadym
Yazdanparast, Sanaz
Advisor's Department
Chemistry
Funding Source
Missouri S&T
Abstract
A new group of two dimensional materials, MXenes, are produced by etching the A-group from MAX phase using Hydrofluoric acid. The purpose in our study is to find out the ideal concentration of sulfuric acid for etching MXenes.
Solutions with different concentrations of sulfuric acid were produced. These solutions were stirred for 7-10 days and then mixed with water and centrifuged. This step was repeated until the pH was 5-6. The solution was then centrifuged for 1 hour and the resulting colloidal solution was then collected.
Lower concentrations of sulfuric acid are too weak to etch MXene and higher concentrations are to strong and over-etch. The solution with the highest concentration of MXene in the colloidal solution was 40% sulfuric acid.
The advantage of these results is that we can now use sulfuric acid to etch MXene instead of hydrofluoric acid, because sulfuric acid is a safer acid to use.
Biography
Maverick Gray is a first year biology student at Missouri University of Science and technology. He received a high school diploma at Fort Zumwalt South High school in 2017. In high school he took his first job at a Papa Murphy’s where he was promoted to supervisor, and from this experience he learned leadership skills and the value of hard work. In the future he is looking to use his degree for research.
Research Category
Sciences
Presentation Type
Poster Presentation
Document Type
Poster
Location
Upper Atrium
Presentation Date
17 Apr 2018, 9:00 am - 12:00 pm
Etching MXene using Sulfuric Acid
Upper Atrium
A new group of two dimensional materials, MXenes, are produced by etching the A-group from MAX phase using Hydrofluoric acid. The purpose in our study is to find out the ideal concentration of sulfuric acid for etching MXenes.
Solutions with different concentrations of sulfuric acid were produced. These solutions were stirred for 7-10 days and then mixed with water and centrifuged. This step was repeated until the pH was 5-6. The solution was then centrifuged for 1 hour and the resulting colloidal solution was then collected.
Lower concentrations of sulfuric acid are too weak to etch MXene and higher concentrations are to strong and over-etch. The solution with the highest concentration of MXene in the colloidal solution was 40% sulfuric acid.
The advantage of these results is that we can now use sulfuric acid to etch MXene instead of hydrofluoric acid, because sulfuric acid is a safer acid to use.
