Development of Barium Titanate Single Layer Thin Film Capacitors
Department
Materials Science and Engineering
Major
Metallurgical Engineering
Research Advisor
Huebner, Wayne
O'Keefe, Matthew
Advisor's Department
Materials Science and Engineering
Funding Source
Sandia/KCP Honeywell Plant
Abstract
Discrete electrical components such as capacitors, resistors, resonators, and inductors are still soldered onto the surfaces. The next generation of technology will be to integrate these components into or onto a low temperature co-fired ceramic substrate (LTCC).
The objective of this work is to develop thin film sputtering techniques that will yield single layer capacitors directly on top of a LTCC substrate. It is desirable to minimize the size of the capacitor by increasing the K or decreasing the thickness. At the same time the dielectric must have a high insulation resistance.
The capacitors were made from 50 nm nickel electrodes and a 300nm BaTiO3 dielectric. A physical mask of 74um x 74 um was used to increase the number of viable test points. The yield for positive test points was approximately 61%. A positive test point has a high resistance, approximately 109-10Ω.
Biography
Kyle Borgmann is a senior in the Metallurgical Engineering department and was born in Washington, MO. He attended East Central College for three years before transferring to Missouri S&T in 2006. He has had several internships ranging from working in a copper mine in Tucson, AZ to a stainless steel foundry in Pevely, MO. He will be graduating in May, 2009.
Research Category
Engineering
Presentation Type
Poster Presentation
Document Type
Poster
Location
Upper Atrium/Hallway
Presentation Date
08 Apr 2009, 1:00 pm - 3:00 pm
Development of Barium Titanate Single Layer Thin Film Capacitors
Upper Atrium/Hallway
Discrete electrical components such as capacitors, resistors, resonators, and inductors are still soldered onto the surfaces. The next generation of technology will be to integrate these components into or onto a low temperature co-fired ceramic substrate (LTCC).
The objective of this work is to develop thin film sputtering techniques that will yield single layer capacitors directly on top of a LTCC substrate. It is desirable to minimize the size of the capacitor by increasing the K or decreasing the thickness. At the same time the dielectric must have a high insulation resistance.
The capacitors were made from 50 nm nickel electrodes and a 300nm BaTiO3 dielectric. A physical mask of 74um x 74 um was used to increase the number of viable test points. The yield for positive test points was approximately 61%. A positive test point has a high resistance, approximately 109-10Ω.
Comments
Joint project with Abbe Deoring and Roger Rettig