Abstract
We have fabricated three-dimensional optically active ZnO photonic crystals by infiltrating polystyrene opal templates using a low-temperature atomic layer deposition process. The polystyrene is removed by firing the samples at elevated temperatures, and reactive ion etching is used to remove the top layer of ZnO and expose the (111) photonic crystal surface. The resulting structures have high filling fractions, possess photonic band gaps in the near-UV to visible spectrum, and exhibit efficient photoluminescence.
Recommended Citation
M. Scharrer et al., "Fabrication of Inverted Opal ZnO Photonic Crystals by Atomic Layer Deposition," Applied Physics Letters, Institute of Physics - IOP Publishing, Jan 2005.
The definitive version is available at https://doi.org/10.1063/1.1900957
Department(s)
Physics
Sponsor(s)
National Science Foundation (U.S.)
Keywords and Phrases
Atomic Layer Deposition; Photoluminescence; Photonic crystals
International Standard Serial Number (ISSN)
0003-6951
Document Type
Article - Journal
Document Version
Final Version
File Type
text
Language(s)
English
Rights
© 2005 Institute of Physics - IOP Publishing, All rights reserved.
Publication Date
01 Jan 2005
