Increased Optical Damage Resistance In Lithium Niobate

Author

D. A. Bryan
Robert Gerson, Missouri University of Science and Technology
H. E. Tomaschke

Abstract

We have confirmed greatly improved resistance to photorefractive damage in compositions of lithium niobate containing 4.5 at. % MgO or more. Holographic diffraction measurements of photorefraction demonstrated that the improved performance is due to a hundredfold increase in the photoconductivity, rather than a decrease in the Glass current. The diffraction efficiency shows an Arrhenius dependence on temperature, with an activation energy of 0.1 eV for the damage-resistant compositions, compared with 0.5 eV for undoped or low-magnesium compositions. The damage-resistant compositions are distinguished by a 2.83-μm absorption line instead of the usual 2.87-μm line due to the OH-stretch vibration.

Recommended Citation

D. A. Bryan et al., "Increased Optical Damage Resistance In Lithium Niobate," Applied Physics Letters, vol. 44, no. 9, pp. 847 - 849, American Institute of Physics, Dec 1984.

The definitive version is available at https://doi.org/10.1063/1.94946

Department(s)

Physics

International Standard Serial Number (ISSN)

0003-6951

Document Type

Article - Journal

Document Version

Final Version

File Type

text

Language(s)

English

Rights

© 2023 American Institute of Physics, All rights reserved.

Publication Date

01 Dec 1984