Abstract
We have confirmed greatly improved resistance to photorefractive damage in compositions of lithium niobate containing 4.5 at. % MgO or more. Holographic diffraction measurements of photorefraction demonstrated that the improved performance is due to a hundredfold increase in the photoconductivity, rather than a decrease in the Glass current. The diffraction efficiency shows an Arrhenius dependence on temperature, with an activation energy of 0.1 eV for the damage-resistant compositions, compared with 0.5 eV for undoped or low-magnesium compositions. The damage-resistant compositions are distinguished by a 2.83-μm absorption line instead of the usual 2.87-μm line due to the OH-stretch vibration.
Recommended Citation
D. A. Bryan et al., "Increased Optical Damage Resistance In Lithium Niobate," Applied Physics Letters, vol. 44, no. 9, pp. 847 - 849, American Institute of Physics, Dec 1984.
The definitive version is available at https://doi.org/10.1063/1.94946
Department(s)
Physics
International Standard Serial Number (ISSN)
0003-6951
Document Type
Article - Journal
Document Version
Final Version
File Type
text
Language(s)
English
Rights
© 2023 American Institute of Physics, All rights reserved.
Publication Date
01 Dec 1984
