Amorphization Of Silicon By Ion Implantation: Homogeneous Or Heterogeneous Nucleation?
Recommended Citation
J. R. Dennis and E. B. Hale, "Amorphization Of Silicon By Ion Implantation: Homogeneous Or Heterogeneous Nucleation?," Radiation Effects, vol. 30, no. 4, pp. 219 - 225, Taylor and Francis Group, Jan 1976.
The definitive version is available at https://doi.org/10.1080/00337577608240825
Department(s)
Physics
International Standard Serial Number (ISSN)
0033-7579
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2023 Taylor and Francis Group, All rights reserved.
Publication Date
01 Jan 1976
Comments
Research Corporation for Science Advancement, Grant None