Microstructure of Thin Iron Carbide Films Prepared in a Glow Discharge
Abstract
Thin (50-80 nm) iron carbide films were grown on carbon-coated copper grids in an r.f. glow discharge using iron pentacarbonyl and hydrogen as starting materials. The substrate temperatures were varied in the range 200-500 °C. The microstructure and phases present in these films are compared with the corresponding results previously obtained by X-ray diffraction, atomic force microscopy, scanning electron microscopy and Auger electron spectroscopy for thick (200-1100 nm) films grown on glass substrates. Transmission electron microscopy studies show that the 50-80 nm films contain a mixture of phases at all deposition temperatures. Transmission electron micrographs of annealed films and films deposited at high temperatures show a clear indication of grain growth.
Recommended Citation
H. P. Siriwardane et al., "Microstructure of Thin Iron Carbide Films Prepared in a Glow Discharge," Thin Solid Films, vol. 279, no. 1-2, pp. 155 - 161, Elsevier, Jun 1996.
The definitive version is available at https://doi.org/10.1016/0040-6090(95)08174-7
Department(s)
Physics
Second Department
Materials Science and Engineering
Third Department
Chemistry
Keywords and Phrases
Annealing; Atomic Force Microscopy; Auger Electron Spectroscopy; Glow Discharges; Grain Growth; High Temperature Effects; Iron Compounds; Microstructure; Scanning Electron Microscopy; Thick Films; Transmission Electron Microscopy; X ray Diffraction; Carbon Coated Copper Grids; Glass Substrates; Substrate Temperature; Thin Iron Carbide Films; Thin Films; Iron Carbide
International Standard Serial Number (ISSN)
0040-6090
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 1996 Elsevier, All rights reserved.
Publication Date
01 Jun 1996
