Influence of Deposition Temperature and Rate on the Surface Morphology of Sc Thin Film
Abstract
The growth peculiarity of Sc thin film is simulated by a three-dimensional kinetic Monte Carlo method. The simulation results show that the surface root-mean-square roughness of Sc thin films is increased with the increasing of the deposition rate. The number of initial nucleus of Sc thin films is decreased gradually with the increasing of deposition temperature, and the size of the Sc grains gets larger with the increasing of the deposition temperature. The optimal deposition rate and deposition temperature of Sc thin film are predicted to be 10 ML/s or 3.308 nm/s, and 700 K, respectively. Copyright © Taylor & Francis Group, LLC.
Recommended Citation
X. Chen et al., "Influence of Deposition Temperature and Rate on the Surface Morphology of Sc Thin Film," Integrated Ferroelectrics, Taylor & Francis, Jan 2013.
The definitive version is available at https://doi.org/10.1080/10584587.2013.780445
Meeting Name
International Symposium on Integrated Functionalities, ISIF 2012
Department(s)
Mechanical and Aerospace Engineering
Keywords and Phrases
Monte Carlo; Scandium; Simulation; Surface Morphology; Thin Film
Document Type
Article - Conference proceedings
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2013 Taylor & Francis, All rights reserved.
Publication Date
01 Jan 2013
