Etching Rate Enhancement by Shaped Femtosecond Pulse Train Electron Dynamics Control for Microchannels Fabrication in Fused Silica Glass
Editor(s)
Wilner, Alan E.
Abstract
The dependence of the etching rate on the ultrafast pulse shaping is observed when microchannels are fabricated in fused silica glass using the method of femtosecond laser irradiation followed by chemical etching. In comparison with the conventional femtosecond pulses, the temporally shaped pulse trains can greatly enhance the etching rate under the same processing conditions. The enhancement is mainly attributed to the localized transient electron dynamics control by shaping the ultrafast pulse, resulting in higher photon absorption efficiency and uniform photomodification zone. Furthermore, processing parameters, including pulse delay and pulse energy distribution ratio, have also been investigated to optimize microchannels fabrication.
Recommended Citation
P. Liu et al., "Etching Rate Enhancement by Shaped Femtosecond Pulse Train Electron Dynamics Control for Microchannels Fabrication in Fused Silica Glass," Optics Letters, Optical Society of America, Jan 2013.
The definitive version is available at https://doi.org/10.1364/OL.38.004613
Department(s)
Mechanical and Aerospace Engineering
International Standard Serial Number (ISSN)
0146-9592
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2013 Optical Society of America, All rights reserved.
Publication Date
01 Jan 2013
