Abstract
Scattering near-field scanning optical microscopy (s-NSOM) has been developed to characterize optical near field with spatial resolution on the order of 10 nm. In this work we report investigation of the interferometric patterns commonly occurred in s-NSOM measurements. To reveal the origin of such interference patterns, a simple nano slit is used. Comparing the measured result with a simplified analytical model as well as full-field numerical simulations, it is shown that the interference pattern is predominantly formed by the in-plane component of incidence light and surface plasmon polariton (SPP) launched by the nano slit. This result helps to understand the responses of plasmonic nanostructures during s-NSOM measurements. © 2014 Optical Society of America.
Recommended Citation
Y. Li et al., "The Origin of Interferometric Effect Involving Surface Plasmon Polariton in Scattering Near-field Scanning Optical Microscopy," Optics Express, vol. 22, no. 3, pp. 2965 - 2972, Optica Publishing Group, Feb 2014.
The definitive version is available at https://doi.org/10.1364/OE.22.002965
Department(s)
Mechanical and Aerospace Engineering
Publication Status
Open Access
International Standard Serial Number (ISSN)
1094-4087
Document Type
Article - Journal
Document Version
Final Version
File Type
text
Language(s)
English
Rights
© 2024 Optica Publishing Group, All rights reserved.
Creative Commons Licensing
This work is licensed under a Creative Commons Attribution 4.0 License.
Publication Date
10 Feb 2014
PubMed ID
24663588
