Mask-Based Microsphere Photolithography
Abstract
Microsphere Photolithography (MPL) uses a self-assembled array of transparent microspheres to focus incident ultraviolet radiation and produce an array of photonic jets in photoresist. Typically, the microspheres are self-assembled directly on the photoresist layer and are removed after exposure during development. Reusing the microsphere array reduces the expense of the process. A mask is formed by transferring the self-assembled microsphere array to a transparent tape. This can be used for multiple exposures when pressed into contact with the photoresist. This paper demonstrates the use of this process to pattern infrared metasurface absorbers and discusses the effects of the mask-based MPL process on the metasurface performance.
Recommended Citation
C. Qu and E. C. Kinzel, "Mask-Based Microsphere Photolithography," Proceedings of the ASME 2018 13th International Manufacturing Science and Engineering Conference (2018, College Station, TX), vol. 4, American Society of Mechanical Engineers (ASME), Jun 2018.
The definitive version is available at https://doi.org/10.1115/MSEC2018-6687
Meeting Name
ASME 2018 13th International Manufacturing Science and Engineering Conference, MSEC 2018 (2018: Jun. 18-22, College Station, TX)
Department(s)
Mechanical and Aerospace Engineering
Keywords and Phrases
Manufacture; Photoresists; Metasurface; Micro/nano fabrications; Microsphere arrays; Multiple exposure; Photoresist layers; Self-assembled arrays; Self-assembled microspheres; Microspheres; Mask-based; Micro/nano fabrication process; Microsphere photolithography
International Standard Book Number (ISBN)
978-0-7918-5138-8
Document Type
Article - Conference proceedings
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2018 American Society of Mechanical Engineers (ASME), All rights reserved.
Publication Date
01 Jun 2018
