Iron Nitride Films Formed in a R. F. Glow Discharge
Abstract
Fe 2N and Fe 3N films were deposited in an r.f. glow discharge by introducing Fe(CO) 5 and NH 3 into the reactor. The iron nitride films thus formed exhibited sheet conductivities in the range of 10 2-10 3 ohm -1 cm -1. They exhibited microhardness ranging from 578 to 659 kg mm -2 on glass slides. The effects of the deposition temperature and the nature of the substrate material on the structure and composition of the films were investigated. An Fe 4N layer was formed on iron substrates at 400°C in the plasma nitriding process using NH 3 as the gas source. The Fe 4N layer exhibited a microhardness of 230 kg mm -2. The effect of the temperature on the formation of the nitrided layer is discussed. © 1992.
Recommended Citation
J. L. Li et al., "Iron Nitride Films Formed in a R. F. Glow Discharge," Materials Science and Engineering: B, Elsevier, Jan 1992.
The definitive version is available at https://doi.org/10.1016/0921-5107(92)90059-I
Department(s)
Materials Science and Engineering
Second Department
Chemistry
International Standard Serial Number (ISSN)
0921-5107
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 1992 Elsevier, All rights reserved.
Publication Date
01 Jan 1992
