"Iron Carbide Films Formed by Plasma Deposition and Plasma Carburizing" by J. L. Li, Thomas J. O'Keefe et al.
 

Iron Carbide Films Formed by Plasma Deposition and Plasma Carburizing

Abstract

Thin Fe 7C 3 films were successfully prepared in an r.f. glow discharge using Fe(CO) 5 and H 2 as the gas source. The films showed a columnar crystal growth with a particle size less than 0.5 μm. The sheet conductivity of the films was in the range 1.0-5.0 × 10 4 ω -1 cm -1. The microhardness of the film on a glass substrate was 624.0 kgf mm -2. The Fe 7C 3 films formed on glass showed the presence of Fe 7C 3 and α-Fe phases after being annealed at 400 °C for 6 h. However, Fe 3C (cementite) films formed on iron substrates. The influence of the H 2O flow rate on the deposited films was investigated for both Fe(CO) 5 + H 2O and Fe(CO) 5 + H 2 + H 2O systems. The plasma carburizing process was performed using either CO or a mixture of CO and H 2 as the gas source and electrodeposited iron as the substrate. In the CO system, a carbon layer was formed as the main product while in the CO + H 2 system, a homogeneous Fe 3C film with a particle size of less than 0.5 μm and a microhardness of 479.0 kgf mm -2 was formed. © 1990.

Department(s)

Materials Science and Engineering

Second Department

Chemistry

International Standard Serial Number (ISSN)

0921-5107

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 1990 Elsevier, All rights reserved.

Publication Date

01 Jan 1990

Plum Print visual indicator of research metrics
PlumX Metrics
  • Citations
    • Citation Indexes: 9
  • Usage
    • Abstract Views: 2
  • Captures
    • Readers: 3
see details

Share

 
COinS
 
 
 
BESbswy