Abstract
The chemical solution deposition (CSD) technique as a highly flexible method for the fabrication of electronic oxide thin films is reviewed. Various chemical aspects of different approaches are discussed, including sol-gel, hybrid, and metallo-organic decomposition (MOD) routes, which all have been successfully applied for the deposition of this class of materials. Principles of the selection and properties of the educts, the mechanism of film crystallization, and tailoring of microstructure through manipulation of deposition parameters are reported. the role of thermodynamics on the phase transformation process is also reviewed. Finally, some of the applications for chemical solution-derived thin films currently under development are illustrated, and recent advances, such as the deposition of less than 100-nm-thick films, lateral nano structuring, and the formation of single nano-sized grains are considered. © 2004 Académie des sciences. Published by Elsevier SAS. All rights reserved.
Recommended Citation
R. W. Schwartz et al., "Chemical Solution Deposition of Electronic Oxide Films," Comptes Rendus Chimie, vol. 7, no. 5, pp. 433 - 461, Académie des Sciences, Jan 2004.
The definitive version is available at https://doi.org/10.1016/j.crci.2004.01.007
Department(s)
Materials Science and Engineering
Keywords and Phrases
Chemical solution deposition; Dielectrics; Electronic oxide films; Epitaxial films; Ferroelectrics; Microstructure; Nanotechnology; Ultra-thin films
International Standard Serial Number (ISSN)
1631-0748
Document Type
Article - Journal
Document Version
Final Version
File Type
text
Language(s)
English
Rights
© 2024 The Authors, All rights reserved.
Creative Commons Licensing
This work is licensed under a Creative Commons Attribution 4.0 License.
Publication Date
01 Jan 2004
