Characterization of the Nanoscale Microstructure of an Immersion Silver on Sputtered Copper
Abstract
Silver has grown its attraction of the scientists in microelectronic field recently. Electrochemical deposition of silver onto copper substrates by immersion method has been one of the keen topics. in this study, ethanol was used as the plating solution in which some chemicals were added. the silver deposits were characterized by a field emission scanning electron microscopy (FESEM), an atom force microscope (AFM), a transmission electron microscope (TEM) and a selected area electron diffraction (SAED). It was found that silver immersion using ethanol-Based bath has good coverage feature. the highlands of the copper substrate are coated by silver particles whose sizes are around 12 nm, but those sizes at low-lying lands are a little smaller.
Recommended Citation
D. Tang et al., "Characterization of the Nanoscale Microstructure of an Immersion Silver on Sputtered Copper," Jiegou Huaxue, vol. 24, no. 8, pp. 935 - 939, Fujian Institute of Research of the Structure of Matter, Sep 2005.
Department(s)
Materials Science and Engineering
Keywords and Phrases
Copper; Immersion; Nanoparticles; Silver
International Standard Serial Number (ISSN)
0254-5861
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2024 Fujian Institute of Research of the Structure of Matter, All rights reserved.
Publication Date
15 Sep 2005