Abstract
A dense, substantially gas-tight, electrically conductive interconnection layer is formed on an air electrode structure of an electrochemical cell by (A) providing an electrode surface; (B) forming on a selected portion of the electrode surface, a layer of doped LaCrO.sub.3 particles doped with an element selected from Ca, Sr, Ba, Mg, Co, Ni, Al and mixtures thereof by plasma spraying doped LaCrO.sub.3 powder, preferably compensated with chromium as Cr.sub.2 O.sub.3 and/or dopant element, preferably by plasma arc spraying; and, (C) heating the doped and compensated LaCrO.sub.3 layer to about 1100 to provide a dense, substantially gas-tight, substantially hydration-free, electrically conductive interconnection material bonded to the electrode surface. A solid electrolyte layer can be applied to the unselected portion of the air electrode, and a fuel electrode can be applied to the solid electrolyte, to provide an electrochemical cell.
Recommended Citation
C. J. Spengler et al., "Method of Forming a Plasma Sprayed Interconnection Layer on an Electrode of an Electrochemical Cell," U.S. Patents, Jan 1995.
Department(s)
Materials Science and Engineering
Patent Application Number
US08/195,774
Patent Number
US5426003A
Document Type
Patent
Document Version
Final Version
File Type
text
Language(s)
English
Rights
© 1995 Siemens Energy Inc. and Westinghouse Electric Corp., All rights reserved.
Publication Date
01 Jan 1995
