Microstructure of Fe₇C₃ Formed at 3000°C by Plasma Enhanced Chemical Vapor Deposition (PECVD)

Abstract

Thin iron carbide films were prepared by introducing iron penta carbonyl (FeCO5) and hydrogen (H2) into a glow discharge. The films are of potential interest in corrosion and wear resistant application. X-ray diffraction data of films (≈7000 Angstrom thick) deposited on glass at 300°C evidenced only Fe7C3. Thinner films were required for examination by analytical and high resolution transmission electron microscopy. Therefore, two sets of films ('thin' <200 Angstrom and "thick" ≈800 Angstrom) were plasma-deposited on carbon or holey carbon films supported on copper girds.

Meeting Name

Materials Research Society Symposium Q1-Magnetic Ultrathin Films, Multilayers and Surfaces/Magnetic Interfaces-Physics and Characterizations(1993: Apr. 12-16, San Francisco, CA)

Department(s)

Materials Science and Engineering

Second Department

Physics

Third Department

Chemistry

Keywords and Phrases

Chemical Vapor Deposition; Grain Boundaries; Plasma Applications; Thin Films; Transmission Electron Microscopy; Iron Carbide Films; Plasma Enhanced Chemical Vapor Deposition (PECVD); Microstructure

International Standard Book Number (ISBN)

1558992111

International Standard Serial Number (ISSN)

0272-9172

Document Type

Article - Conference proceedings

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 1993 Materials Research Society, All rights reserved.

Publication Date

01 Apr 1993

Link to Full Text

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