Microstructure of Fe₇C₃ Formed at 3000°C by Plasma Enhanced Chemical Vapor Deposition (PECVD)
Abstract
Thin iron carbide films were prepared by introducing iron penta carbonyl (FeCO5) and hydrogen (H2) into a glow discharge. The films are of potential interest in corrosion and wear resistant application. X-ray diffraction data of films (≈7000 Angstrom thick) deposited on glass at 300°C evidenced only Fe7C3. Thinner films were required for examination by analytical and high resolution transmission electron microscopy. Therefore, two sets of films ('thin' <200 Angstrom and "thick" ≈800 Angstrom) were plasma-deposited on carbon or holey carbon films supported on copper girds.
Recommended Citation
H. P. Siriwardane et al., "Microstructure of Fe₇C₃ Formed at 3000°C by Plasma Enhanced Chemical Vapor Deposition (PECVD)," Proceedings of the Materials Research Society Symposium (1993, San Francisco, CA), vol. 313, pp. 691 - 696, Materials Research Society, Apr 1993.
The definitive version is available at https://doi.org/10.1557/PROC-313-691
Meeting Name
Materials Research Society Symposium Q1-Magnetic Ultrathin Films, Multilayers and Surfaces/Magnetic Interfaces-Physics and Characterizations(1993: Apr. 12-16, San Francisco, CA)
Department(s)
Materials Science and Engineering
Second Department
Physics
Third Department
Chemistry
Keywords and Phrases
Chemical Vapor Deposition; Grain Boundaries; Plasma Applications; Thin Films; Transmission Electron Microscopy; Iron Carbide Films; Plasma Enhanced Chemical Vapor Deposition (PECVD); Microstructure
International Standard Book Number (ISBN)
1558992111
International Standard Serial Number (ISSN)
0272-9172
Document Type
Article - Conference proceedings
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 1993 Materials Research Society, All rights reserved.
Publication Date
01 Apr 1993
