Masters Theses

Abstract

"Atomic Layer Deposition is a robust technique used to deposit high quality, conformal, and size-tunable ultrathin films on a substrate. This technique can be used to coat protective films on battery anode and cathode materials for enhanced performance. In the case of cathodes, the ultrathin film provides a protective barrier preventing cationic dissolution. In the case of anodes, the film acts as a supporting matrix reducing strain caused by volume expansions. In these study, we use this technique to coat an optimally thick conductive iron oxide film on tin oxide particles to improve its electrochemical performance at high current densities when tested in a practical voltage window. The conductive nature of the iron oxide film enabled faster kinetics at the interface for Li+ transfer that enabled improved performance"--Abstract, page iv.

Advisor(s)

Liang, Xinhua

Committee Member(s)

Choudhury, Amitava
Rownaghi, Ali

Department(s)

Chemical and Biochemical Engineering

Degree Name

M.S. in Chemical Engineering

Sponsor(s)

National Science Foundation (U.S.)

Comments

This work was supported in part by the National Science Foundation grant NSF CBET 1510085.

Publisher

Missouri University of Science and Technology

Publication Date

Fall 2016

Journal article titles appearing in thesis/dissertation

  • Enhanced cycle life and capacity retention of iron oxide ultrathin film coated SnO2 nanoparticles at high current densities

Pagination

x, 46 pages

Note about bibliography

Includes bibliographical references.

Rights

© 2016 Sai Abhishek Palaparty

Document Type

Thesis - Open Access

File Type

text

Language

English

Subject Headings

Atomic layer depositionLithium ion batteriesNanostructured materialsThin films

Thesis Number

T 11047

Electronic OCLC #

974714798

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