Abstract
This paper demonstrates a new fabrication process for gallium nitride high-electron mobility transistors (HEMTs) free of plasma damages in the sub-100 nm T-shape gate area. The common peeling-off problems of electron beam resists during gate metal deposition process were solved by introducing a fluorine plasma treatment process before gate metal deposition. By combining dry and wet etching processes appropriately, an on/off ratio of 107 at a drain-to-source voltage of 1 V was achieved. This work also investigated the short channel effect in devices with gate lengths from 70 to 440 nm. Reducing gate length results in decrease of threshold voltage due to the drain-induced barrier-lowering effect. Current gain cut-off frequency fT and maximum oscillation frequency fmax increase while gate length reduces till 250 nm. However, below 250 nm, fT and fmax no longer increase while gate length reduces till sub-100 nm, which reflect the short channel effect.
Recommended Citation
S. Lei et al., "Low Leakage GaN HEMTs with Sub-100 Nm T-shape Gates Fabricated by a Low-damage Etching Process," Journal of Materials Science Materials in Electronics, vol. 31, no. 8, pp. 5886 - 5891, Springer, Apr 2020.
The definitive version is available at https://doi.org/10.1007/s10854-019-02758-z
Department(s)
Electrical and Computer Engineering
International Standard Serial Number (ISSN)
1573-482X; 0957-4522
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2025 Springer, All rights reserved.
Publication Date
01 Apr 2020
Comments
Guangdong Science and Technology Department, Grant 20180305180619573