"Spin Mechanisms in Gd-doped GaN Implanted with Oxygen Carbon at Room T" by Vishal Saravade, Amirhossein Ghods et al.
 

Abstract

Gadolinium-doped gallium nitride implanted with oxygen and carbon show carrier-mediated spin mechanisms at room temperature. As-grown Gd-doped GaN grown by metal-organic chemical vapor deposition using a tris(cyclopentadienyl) gadolinium precursor shows Ordinary Hall Effect and no ferromagnetism at room temperature. Upon O or C implantation in Gd-doped GaN, Anomalous Hall Effect that is indicative of carrier-mediated spin and ferromagnetism is observed. A good crystal quality is maintained even after implantation. O and C favor interstitial sites and occupy deep-level acceptor-type states in Gd-doped GaN. Room-temperature spin and ferromagnetism that is induced by gadolinium in Gd-doped GaN is activated by O and C that occupy interstitial sites. Carrier-mediated mechanism for spin functionalities shows potential for the control and manipulation of spin as a quantum state in gallium nitride. This makes GaGdN:OC a potential semiconductor material base of interest for room temperature spintronics and quantum information science applications. In this paper, doping of O and C in Gd-doped GaN using ion implantation, structural characterization using X-ray diffraction, and spin-related measurement using Advanced Hall Effect are investigated, and corresponding discussions are made.

Department(s)

Electrical and Computer Engineering

Keywords and Phrases

Anomalous Hall Effect; Gallium nitride; Quantum materials; Spintronics

International Standard Serial Number (ISSN)

1558-4542; 1077-260X

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2025 Institute of Electrical and Electronics Engineers, All rights reserved.

Publication Date

01 Jan 2025

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