Abstract

In this work, an effective strategy for achieving efficient p-type doping in wide bandgap nitride semiconductors was proposed to overcome the fundamental issue of high activation energy. We demonstrated that a hole concentration as high as 1.4 x 1018 cm-3 could been achieved through In-Mg co-doping. The electronic structure of the system and the formation energy of impurity were analyzed via first principal calculation to clarify the underlying physics and the ambiguity in understanding of the origin of the high hole concentration. Our results indicated that the original valence band maximum of the host materials could be modified, thus improving the p-type dopability. We showed that the calculated ionization energy ε(-/0) of acceptor is only about 135 meV, which is much smaller than that of the isolated Mg acceptor.

Department(s)

Electrical and Computer Engineering

Comments

National Science Foundation, Grant 2013AA03A101

International Standard Serial Number (ISSN)

2046-2069

Document Type

Article - Journal

Document Version

Final Version

File Type

text

Language(s)

English

Rights

© 2024 The Authors, All rights reserved.

Publication Date

01 Jan 2016

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