Title

Auto Focus for Far Field Source Localization using Emission Source Microscopy

Abstract

Emission source microscopy (ESM) is a useful technique to locate emission sources contributing to far-field radiation. The focusing distance can affect image qualities and confuse the localization of radiation sources. This paper adopts the autofocus method in image processing to calculate the optimal focusing distance with the best image quality. The proposed methodology was verified using a numerical simulation as well as a measurement. Also, calculating the contrast of a local source region shows better noise immunity. This autofocus algorithm in ESM can easily obtain the exact distance between the radiation sources and the scanning plane and can be used to localize sources in 3D space.

Meeting Name

2021 IEEE International Joint Electromagnetic Compatibility Signal and Power Integrity and EMC Europe Symposium, EMC/SI/PI/EMC Europe 2021 (2021: Jul. 26-Aug. 13, Raleigh, NC)

Department(s)

Electrical and Computer Engineering

Research Center/Lab(s)

Electromagnetic Compatibility (EMC) Laboratory

Comments

This work was supported in part by the National Science Foundation (NSF) under Grant IIP-1916535.

Keywords and Phrases

Auto-Focus; Emission Source Microscopy; Far-Field Source

International Standard Book Number (ISBN)

978-166544888-8

Document Type

Article - Conference proceedings

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2021 Institute of Electrical and Electronics Engineers (IEEE), All rights reserved.

Publication Date

13 Aug 2021

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