Auto Focus for Far Field Source Localization using Emission Source Microscopy
Abstract
Emission source microscopy (ESM) is a useful technique to locate emission sources contributing to far-field radiation. The focusing distance can affect image qualities and confuse the localization of radiation sources. This paper adopts the autofocus method in image processing to calculate the optimal focusing distance with the best image quality. The proposed methodology was verified using a numerical simulation as well as a measurement. Also, calculating the contrast of a local source region shows better noise immunity. This autofocus algorithm in ESM can easily obtain the exact distance between the radiation sources and the scanning plane and can be used to localize sources in 3D space.
Recommended Citation
L. Zhang et al., "Auto Focus for Far Field Source Localization using Emission Source Microscopy," Proceedings of the 2021 Joint IEEE International Symposium on EMC/SI/PI, and EMC Europe (2021, Raleigh, NC), pp. 115 - 118, Institute of Electrical and Electronics Engineers (IEEE), Aug 2021.
The definitive version is available at https://doi.org/10.1109/EMC/SI/PI/EMCEurope52599.2021.9559171
Meeting Name
2021 IEEE International Joint Electromagnetic Compatibility Signal and Power Integrity and EMC Europe Symposium, EMC/SI/PI/EMC Europe 2021 (2021: Jul. 26-Aug. 13, Raleigh, NC)
Department(s)
Electrical and Computer Engineering
Research Center/Lab(s)
Electromagnetic Compatibility (EMC) Laboratory
Keywords and Phrases
Auto-Focus; Emission Source Microscopy; Far-Field Source
International Standard Book Number (ISBN)
978-166544888-8
Document Type
Article - Conference proceedings
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2021 Institute of Electrical and Electronics Engineers (IEEE), All rights reserved.
Publication Date
13 Aug 2021
Comments
This work was supported in part by the National Science Foundation (NSF) under Grant IIP-1916535.