Emission Source Microscopy Technique for EMI Source Localization

Abstract

For large, complex systems with multiple sources at the same frequency, localizing the sources of radiation often proves difficult. This paper presents an emission source microscopy (ESM) technique derived from synthetic aperture radar (SAR) to localize radiating sources on a PCB. Near-field scanning provides limited information about the components contributing to far-field radiation. This paper presents the source localization methodology, supported by simulation and measurement results. After localizing the sources, the far-field contribution and the total radiated power from each individual source can be estimated. The results show that the proposed method can distinguish between multiple radiating sources on a complex PCB.

Department(s)

Electrical and Computer Engineering

Research Center/Lab(s)

Electromagnetic Compatibility (EMC) Laboratory

Keywords and Phrases

Polychlorinated biphenyls; Far-field radiation; Limited information; Microscopy technique; Near-field scanning; Radiating sources; Simulations and measurements; Source localization; Total radiated power; Synthetic aperture radar; Electromagnetic interference (EMI); emission source microscopy

International Standard Serial Number (ISSN)

0018-9375

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2016 Institute of Electrical and Electronics Engineers (IEEE), All rights reserved.

Publication Date

01 Jun 2016

Link to Full Text

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