Doctoral Dissertations

Keywords and Phrases

Adhesion; Capacitor; Dielectric constant; Low temperature cofired ceramic; Thin film

Abstract

"Capacitors are critical devices in microelectronic assemblies that must be incorporated into electronic systems through a variety of ways such as integrated or discrete devices. This work has developed new thin film capacitors deposited directly onto multichip module or printed circuit board surfaces to benefit from closer integration that enhances system performance for use in high reliability applications. The capacitors serve as filters or provide tuning and energy storage functions. Unexpected performance was observed during development that included low adhesion of the films to the substrates, higher effective dielectric constants than reported in literature, and low yields. Three publications resulted from this work with Paper I presenting a study of thin films on low temperature cofired ceramic (LTCC) and their reliability for multiple functions. The thin film and LTCC system are modeled with results suggesting a mechanism of enhancing thin film adhesion to the LTCC through a combination film composition and surface modification. Paper II presents measurements of dielectric properties of thin film capacitors on LTCC. Multiple mechanisms are detailed that contribute to the measured dielectric constant values of the capacitors. One case is modeled to determine the extent of dielectric constant enhancement from fringe fields related to capacitor dimensions. Paper III describes the behavior of thin film capacitors with varying electrode compositions and configurations. Trends are observed that suggest energy band overlap and electrode work functions are influential in dielectric properties and yield of the capacitors. A preferred electrode composition and configuration is suggested based on the capacitor performance"--Abstract, page iii.

Advisor(s)

Huebner, Wayne
Schwartz, Robert W.

Committee Member(s)

Brow, Richard K.
Fahrenholtz, William
Drewniak, James L.
Wolf, J. Ambrose

Department(s)

Materials Science and Engineering

Degree Name

Ph. D. in Ceramic Engineering

Comments

This work was funded by the Department of Energy’s Kansas City National Security Campus, operated by Honeywell Federal Manufacturing & Technologies, LLC under contract number DE-NA0002839.

Publisher

Missouri University of Science and Technology

Publication Date

Summer 2021

Journal article titles appearing in thesis/dissertation

  • Thermodynamic analysis of physical vapor deposited inorganic thin films on low temperature cofired ceramic
  • Contributions to dielectric constant enhancement in thin film metal insulator metal capacitors
  • Effect of electrode composition on performance of sputter deposited MIM capacitors on LTCC substrates

Pagination

xii, 80 pages

Note about bibliography

Includes bibliographic references.

Rights

© 2021 Daniel Scott Krueger, All rights reserved.

Document Type

Dissertation - Open Access

File Type

text

Language

English

Thesis Number

T 11905

Electronic OCLC #

1286686978

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