Doctoral Dissertations
Abstract
"A variational approach has been used to solve the effective-mass equation, when the impurity ion is located at a depth d from the surface of a semiconductor, where 0 < d < db and db represents the case when the impurity ion is in the bulk of the semiconductor. The ground state and the excited state having the largest electric dipole coupling to the ground state have been determined. We have plotted the energy dependence on the depth of the impurity ion from the surface of the semiconductor. The energy has also been calculated as a function of the orientation of the c-axis of the mass-ellipsoid to the surface of the semi conductor. Finally, the optical absorption coefficient for transitions from the ground state to the excited state has been calculated for the surface, bulk and the near surface states"--Abstract, page ii.
Advisor(s)
Tefft, Wayne E., 1929-1973
Committee Member(s)
Bell, Robert John, 1934-
Rivers, Jack Lewis
Brown, Harry Allen
Penico, Anthony Joseph
Department(s)
Physics
Degree Name
Ph. D. in Physics
Publisher
University of Missouri--Rolla
Publication Date
1970
Pagination
vii, 76 pages
Note about bibliography
Includes bibliographical references (page 60).
Rights
© 1970 Vidal Emmanuel Godwin, All rights reserved.
Document Type
Dissertation - Open Access
File Type
text
Language
English
Subject Headings
Semiconductors -- Impurity distributionEffective mass (Physics)
Thesis Number
T 2396
Print OCLC #
6022698
Electronic OCLC #
853449366
Recommended Citation
Godwin, Vidal Emmanuel, "Theory of shallow donor impurity surface states" (1970). Doctoral Dissertations. 2311.
https://scholarsmine.mst.edu/doctoral_dissertations/2311