Correlation of Relative X-ray Photoelectron Spectroscopy Shake-up Intensity with CuO Particle Size

Author

Charles C. Chusuei, Missouri University of Science and TechnologyFollow
M. A. Brookshier
D. W. Goodman

Abstract

X-ray photoelectron spectroscopy (XPS) analysis of four Cu/SiO2 catalyst systems of different particle sizes of CuO on the surface showed variation in the relative peak area intensities of the shake-up lines to main core levels of the Cu 2p orbitals. These differences were attributed to various degrees of XPS-induced reduction of CuO initially formed on the surface by spin coating copper(II) acetate Cu-(CH3CO2)2·H2O, Cu(ac)2 solutions of varying concentration. Changes in Cu L3M4,5M4,5 X-ray excited Auger (XAES) line shapes under time-dependent exposure to the soft Mg Kα X-rays revealed that smaller particle sizes were more susceptible to reduction to Cu(+1) than larger ones. The degree of reduction of Cu(+2) to Cu(+1) correlated with measured atomic force microscopic (AFM) particle heights of CuO on these substrates prior to XPS.

Recommended Citation

C. C. Chusuei et al., "Correlation of Relative X-ray Photoelectron Spectroscopy Shake-up Intensity with CuO Particle Size," Langmuir, American Chemical Society (ACS), Jan 1999.

The definitive version is available at https://doi.org/10.1021/la9815446

Department(s)

Chemistry

International Standard Serial Number (ISSN)

0743-7463

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 1999 American Chemical Society (ACS), All rights reserved.

Publication Date

01 Jan 1999