Epitaxial Electrodeposition of Thallic Oxide on Single Crystal Gold

Author

A. A. Vertegel
Mark G. Shumsky
Jay A. Switzer, Missouri University of Science and TechnologyFollow

Abstract

Thin films of thallic oxide Tl2O3 (Ia3, a = 1.0534 nm) were electrodeposited on the three low-index surfaces of single crystal Au (Fm3m, a = 0.4079 nm). Epitaxial films of Tl2O3 with a strong out-of-plane (100) texture were obtained in the case of the (100) and (111) Au substrates, while the film on the (110) Au substrate did not show a preferred out-of-plane orientation. Studies of the in-plane orientation of the films revealed that the large lattice mismatch between Au and Tl2O3 is accommodated by the formation of the coincidence lattices on (100) and (111) Au.

Recommended Citation

A. A. Vertegel et al., "Epitaxial Electrodeposition of Thallic Oxide on Single Crystal Gold," Electrochimica Acta, Elsevier, Jan 2000.

The definitive version is available at https://doi.org/10.1016/S0013-4686(00)00427-8

Department(s)

Chemistry

International Standard Serial Number (ISSN)

0013-4686

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2000 Elsevier, All rights reserved.

Publication Date

01 Jan 2000