TEM Studies of Cu₂O-Si and Cu₂O-InP Interfaces Made by Epitaxial Electrodeposition

Author

Fumiyasu Oba
Run Liu
Y. Yu
Eric W. Bohannan, Missouri University of Science and TechnologyFollow
Frank Ernst
Jay A. Switzer, Missouri University of Science and TechnologyFollow

Recommended Citation

F. Oba et al., "TEM Studies of Cu₂O-Si and Cu₂O-InP Interfaces Made by Epitaxial Electrodeposition," Microscopy and Microanalysis, Cambridge University Press, Jan 2004.

The definitive version is available at https://doi.org/10.1017/S1431927604884617

Department(s)

Chemistry

International Standard Serial Number (ISSN)

1431-9276

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2004 Cambridge University Press, All rights reserved.

Publication Date

01 Jan 2004