Abstract
Solution-Based Processing Offers Advantages for Producing Thin Films Due to Scalability, Low Cost, Simplicity, and Benignity to the Environment. Here, We Develop Conductive and Photoactivated Self-Cleaning Reduced Graphene Oxide (RGO)/Ti3CNTx MXene Thin Films Via Spin Coating under Ambient Conditions. the Addition of a Thin RGO Layer on Top of Ti3CNTx Resulted in Up to 45-Fold Improvement in the Environmental Stability of the Film Compared to the Bare Ti3CNTx Film. the Optimized RGO/Ti3CNTx Thin Film Exhibits an Optical Transmittance of 74% in the Visible Region of the Spectrum and a Sheet Resistance of 19 KΩ/sq. the RGO/Ti3CNTx Films Show High Rhodamine B Discoloration Activity Upon Light Irradiation. under UV Irradiation, the Electrically Conductive MXene in Combination with in Situ Formed Semiconducting Titanium Oxide Induces Photogenerated Charge Carriers, Which Could Potentially Be Used in Photocatalysis. on the Other Hand, Due to Film Transparency, White Light Irradiation Can Bleach the Adsorbed Dye Via Photolysis. This Study Opens the Door for using MXene Thin Films as Multifunctional Coatings with Conductive and Potentially Self-Cleaning Properties.
Recommended Citation
M. A. Purbayanto and D. Bury and M. Chandel and Z. D. Shahrak and V. Mochalin and A. Wójcik and D. Moszczyńska and A. Wojciechowska and A. Tabassum and M. Naguib and A. M. Jastrzębska, "Ambient Processed RGO/Ti3CNTx MXene Thin Film with High Oxidation Stability, Photosensitivity, and Self-Cleaning Potential," ACS applied materials & interfaces, vol. 15, no. 37, pp. 44075 - 44086, American Chemical Society, Sep 2023.
The definitive version is available at https://doi.org/10.1021/acsami.3c07972
Department(s)
Chemistry
Publication Status
Open Access
Keywords and Phrases
conductivity; photocatalytic; self-cleaning; stability; Ti3CNTx MXene
International Standard Serial Number (ISSN)
1944-8252
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2023 American Chemical Society, All rights reserved.
Publication Date
20 Sep 2023
PubMed ID
37682978