The glow discharge of a series of saturated fluorocarbons, CnF2n+2 (n = 1, 2, 4, 6, and 8), was studied with glass substrates which do not contain any hydrogen. It was found that the deposition rate was a function of the F/C ratio of the starting fluorocarbons. That is, fluorocarbons with higher F/C ratio, such as CF4 and C2F6, hardly polymerized, while fluorocarbons with lower F/C ratio, such as C8F18, polymerized as well as C2F4. After plasma exposure, the surface of glass substrate was characterized by measurements of water contact angle, water droplet rolling‐off angle, and ESCA. Although all saturated fluorocarbon plasmas could alter the surface more hydrophobic than before, the deposited materials from fluorocarbons with higher F/C were not stable. Also, in plasmas with high F/C fluorocarbons, i.e., CF4 and C2F6, sputtering of the electrode material was observed. © 1992 John Wiley & Sons, Inc. Copyright © 1992 John Wiley & Sons, Inc.
Y. Iriyama and H. Yasuda, "Fundamental Aspect And Behavior Of Saturated Fluorocarbons In Glow Discharge In Absence Of Potential Source Of Hydrogen," Journal of Polymer Science Part A: Polymer Chemistry, vol. 30, no. 8, pp. 1731 - 1739, Wiley, Jan 1992.
The definitive version is available at https://doi.org/10.1002/pola.1992.080300826
Keywords and Phrases
ESCA; plasma polymerization; saturated fluorocarbon; sputtering; surface fluorination
International Standard Serial Number (ISSN)
Article - Journal
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01 Jan 1992