Fundamental Aspect And Behavior Of Saturated Fluorocarbons In Glow Discharge In Absence Of Potential Source Of Hydrogen

Author

Yu Iriyama
H. Yasuda, Missouri University of Science and TechnologyFollow

Abstract

The glow discharge of a series of saturated fluorocarbons, C_nF_2n+2 (n = 1, 2, 4, 6, and 8), was studied with glass substrates which do not contain any hydrogen. It was found that the deposition rate was a function of the F/C ratio of the starting fluorocarbons. That is, fluorocarbons with higher F/C ratio, such as CF₄ and C₂F₆, hardly polymerized, while fluorocarbons with lower F/C ratio, such as C₈F₁₈, polymerized as well as C₂F₄. After plasma exposure, the surface of glass substrate was characterized by measurements of water contact angle, water droplet rolling‐off angle, and ESCA. Although all saturated fluorocarbon plasmas could alter the surface more hydrophobic than before, the deposited materials from fluorocarbons with higher F/C were not stable. Also, in plasmas with high F/C fluorocarbons, i.e., CF₄ and C₂F₆, sputtering of the electrode material was observed. © 1992 John Wiley & Sons, Inc. Copyright © 1992 John Wiley & Sons, Inc.

Recommended Citation

Y. Iriyama and H. Yasuda, "Fundamental Aspect And Behavior Of Saturated Fluorocarbons In Glow Discharge In Absence Of Potential Source Of Hydrogen," Journal of Polymer Science Part A: Polymer Chemistry, vol. 30, no. 8, pp. 1731 - 1739, Wiley, Jan 1992.

The definitive version is available at https://doi.org/10.1002/pola.1992.080300826

Department(s)

Chemistry

Publication Status

Full Access

Keywords and Phrases

ESCA; plasma polymerization; saturated fluorocarbon; sputtering; surface fluorination

International Standard Serial Number (ISSN)

1099-0518; 0887-624X

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2023 Wiley, All rights reserved.

Publication Date

01 Jan 1992