Abstract
A process for forming an epitaxial film comprising spinning a substrate having an ordered crystal structure ; heating the substrate during spinning to a temperature between 70° C. and 150° C .; dripping epitaxial film precursor solution onto the spinning substrate , where the precursor solution comprises inorganic film precursor material in a solvent ; and continuing the heating and spinning to remove the solvent and epitaxially grow the epitaxial film on the substrate .
Recommended Citation
J. A. Switzer, "Spincoating Epitaxial Films,", Nov 2020.
Department(s)
Chemistry
Patent Application Number
16 / 398,430
Patent Number
US 2020/0347512 A1
Document Type
Patent
Document Version
Final Version
File Type
text
Language(s)
English
Rights
© 2021 Curators of the University of Missouri, All rights reserved.
Publication Date
05 Nov 2020
Comments
Assignee : The Curators of the University of Missouri, Columbia , MO (US)