Abstract
A solid substrate comprising a surface comprising an achiral array of atoms having thereupon a chiral metal oxide surface. The chiral metal oxide surface is prepared by electrodeposition of a chiral metal oxide array from a solution of a chiral salt of the metal. In one embodiment, chiral CuO is grown on achiral Au(001) by epitaxial electrodeposition. The handedness of the film is determined by the specific enantiomer of tartrate ion in the deposition solution. (R,R)- tartrate produces an S—CuO(l 1 T) film, while (S,S)-tartrate produces an R—CuO(Tl 1) film. These chiral CuO films are enantiospecific for the electrochemical oxidation of(R,R) and (S,S)-tartrate.
Recommended Citation
J. A. Switzer et al., "Method of Preparing a Chiral Substrate Surface By Electrodeposition," U.S. Patents, Apr 2008.
Department(s)
Chemistry
Patent Application Number
US10/884,868
Patent Number
US7361261B2
Document Type
Patent
Document Version
Final Version
File Type
text
Language(s)
English
Rights
© 2008 The Curators of the University of Missouri, All rights reserved.
Publication Date
22 Apr 2008
