Abstract
A composition is derived from an addition polymerizable organotitanium polymer which upon exposure to an oxygen plasma or baking in air, is converted to titanium dioxide (titania) or is converted to a mixed, titanium-containing metal oxide. The metal oxide formed in situ imparts etch- resistant action to a patterned photoresist layer. The composition may also be directly deposited and patterned into permanent metal oxide device features by a photolithographic process.
Recommended Citation
T. D. Flaim et al., "Highly Plasma Etch-Resistant Photoresist Composition Containing a Photosensitive Polymeric Titania Precursor," U.S. Patents, Oct 2001.
Department(s)
Chemistry
Second Department
Materials Science and Engineering
Patent Application Number
US09/259,229
Patent Number
US6303270B1
Document Type
Patent
Document Version
Final Version
File Type
text
Language(s)
English
Rights
© 2001 The Curators of the University of Missouri, All rights reserved.
Publication Date
16 Oct 2001
