Scalable Nanomanufacturing of Metasurfaces using Nanosphere Photolithography

Abstract

We report on using Nanosphere Photolithography (NPL) for submicron patterning of Frequency Selective Surfaces (FSS). NPL is a combination of two techniques; colloidal nanolithography-where nanospheres form a self-assembled hexagonal close-packed (HCP) array when dispensed on a surface, and photonic jets-which are created when light is incident onto a microsphere in contact with a surface. NPL creates a mask-free HCP hole array in the photoresist. This pattern can be used with evaporation and lift-off to create an array of antenna elements, constituting the FSS. Alternatively, electrodeposition techniques can be used to deposit the metal elements. The later is particularly appealing as it lends itself to reel-to-reel fabrication techniques. Finally, we demonstrate that geometries other than simple hole arrays can be patterned in the photoresist by exposing the microsphere array with off normal incidence light.

Meeting Name

ASME 2014 International Mechanical Engineering Congress and Exposition (2014: Nov. 14-20, Montreal, Canada)

Department(s)

Chemistry

Second Department

Mechanical and Aerospace Engineering

Keywords and Phrases

Frequency Selective Surfaces; Microspheres; Nanosystems; Photolithography; Photoresists; Colloidal Nanolithographies; Electrodeposition Technique; Fabrication Technique; Frequency Selective Surface (FSS); Hexagonal Close Packed; Microsphere Arrays; Nano-Manufacturing; Submicron Patterning; Nanospheres

International Standard Book Number (ISBN)

978-0-7918-4959-0

Document Type

Article - Conference proceedings

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2014 American Society of Mechanical Engineers (ASME), All rights reserved.

Publication Date

20 Nov 2014

Link to Full Text

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