Second-generation 193-nm Bottom Antireflective Coatings (BARCs)

Abstract

Two organic, spin-on BARCs are in the small scale manufacturing phase - with the goal being a 193-nm product optimized for commercialization. Chemistries of the BARCs are shown in this paper and performance of the two products relative to industry accepted needs is discussed. The thermoset BARCs, EXP98090B and EXP99001D, are prepared from hydroxy-functional, dye-attached acrylic polymers by adding an aminoplast and sulfonic acid catalyst. With select 193-nm resists, the BARCs give resolution of L/S pairs down to 0.12 μm. Plasma etch rates of both BARCs are comparable to those of 193-nm photoresists. Other BARC performance parameters that are discussed for the two products include: film and optical properties, conformality, simulated reflectance curves, spin-bowl compatibility, metals content, and defects.

Meeting Name

Proceedings of SPIE - The International Society for Optical Engineering (2000, Santa Clara, CA)

Department(s)

Chemistry

Document Type

Article - Conference proceedings

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2000 SPIE -- The International Society for Optical Engineering, All rights reserved.

Publication Date

01 Jan 2000

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