The present invention discloses a novel method and novel compositions comprising well-dispersed particulate metal materials, including metal nanoparticles and/or metal single-atom materials, on various substrates, said method comprising the use of atomic layer deposition (ALD) and optimization of the metal precursor dose time and the number of ALD cycles. Illustrative of the metals are Fe, Ni, Co, Ru, Rh, Ir, Os, Pt, Pd, and the like; and illustrative of the various substrates are carbon nanotubes (CNTs) (including multi-walled carbon nanotubes (MWCNTs), SiO2, TiO2, alumina, CeO2, ZnO, ZrO2, activated carbon, CuO, Fe2O3, MgO, CaO, graphene, and the like. The density of the dispersed metals on the substrates is significantly higher than the metal density
X. Liang and X. Wang, "Novel Method of Manufacture of Metal Nanoparticles and Metal Single-Atom Materials on Various Substrates and Novel Compositions,", Aug 2021.
Chemical and Biochemical Engineering
Patent Application Number
US 2021/0252486 A1
© 2021 Curators of the University of Missouri, All rights reserved.
19 Aug 2021