Abstract

The present invention discloses a novel method and novel compositions comprising well-dispersed particulate metal materials, including metal nanoparticles and/or metal single-atom materials, on various substrates, said method comprising the use of atomic layer deposition (ALD) and optimization of the metal precursor dose time and the number of ALD cycles. Illustrative of the metals are Fe, Ni, Co, Ru, Rh, Ir, Os, Pt, Pd, and the like; and illustrative of the various substrates are carbon nanotubes (CNTs) (including multi-walled carbon nanotubes (MWCNTs), SiO2, TiO2, alumina, CeO2, ZnO, ZrO2, activated carbon, CuO, Fe2O3, MgO, CaO, graphene, and the like. The density of the dispersed metals on the substrates is significantly higher than the metal density

Department(s)

Chemical and Biochemical Engineering

Comments

Current Assignee: University of Missouri System

Patent Application Number

US16/972,845

Patent Number

US 2021/0252486 A1

Document Type

Patent

Document Version

Final Version

File Type

text

Language(s)

English

Rights

© 2021 Curators of the University of Missouri, All rights reserved.

Publication Date

19 Aug 2021

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