Abstract

Atomic layer deposition (ALD) was used to produce Pd/Al2O 3 catalysts using sequential exposures of Pd (II) hexafluoro acetylacetonate and formalin at 200 °C in a fluidized bed reactor. the ALD-prepared Pd/alumina catalysts were characterized by various methods including hydrogen chemisorption, XPS, and TEM, and compared with a commercially available 1 wt.% Pd/alumina catalyst, which was also characterized. the content of Pd on alumina support and the size of Pd nanoparticles can be controlled by the number of ALD-coating cycles and the dose time of the Pd precursor. One layer of organic component from the Pd precursor remained on the Pd particle surface. the ALD 0.9 wt.% Pd/alumina had greater active metal surface area and percent metal dispersion than the commercial 1 wt.% Pd/alumina catalyst. the ALD and commercial catalysts were subjected to catalytic testing to determine their relative activities for glucose oxidation to gluconic acid in aqueous solution. the ALD 0.9 wt.% Pd/alumina catalyst had comparable activity as compared to the commercial 1 wt.% Pd catalyst. No noticeable amount of Pd leaching was observed for the ALD-prepared catalysts during the vigorously stirred reaction. © 2012 Springer Science Business Media B.V.

Department(s)

Chemical and Biochemical Engineering

Keywords and Phrases

Atomic layer deposition (ALD); Fluidized bed reactor; Glucose oxidation; Nanoparticle (NP); Palladium (Pd)

International Standard Serial Number (ISSN)

1572-896X; 1388-0764

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2024 Springer, All rights reserved.

Publication Date

01 Jun 2012

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