We have fabricated three-dimensional optically active ZnO photonic crystals by infiltrating polystyrene opal templates using a low-temperature atomic layer deposition process. The polystyrene is removed by firing the samples at elevated temperatures, and reactive ion etching is used to remove the top layer of ZnO and expose the (111) photonic crystal surface. The resulting structures have high filling fractions, possess photonic band gaps in the near-UV to visible spectrum, and exhibit efficient photoluminescence.
M. Scharrer et al., "Fabrication of Inverted Opal ZnO Photonic Crystals by Atomic Layer Deposition," Applied Physics Letters, Institute of Physics - IOP Publishing, Jan 2005.
The definitive version is available at http://dx.doi.org/10.1063/1.1900957
National Science Foundation (U.S.)
Keywords and Phrases
Atomic Layer Deposition; Photoluminescence; Photonic crystals
Article - Journal
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