Abstract

We have fabricated three-dimensional optically active ZnO photonic crystals by infiltrating polystyrene opal templates using a low-temperature atomic layer deposition process. The polystyrene is removed by firing the samples at elevated temperatures, and reactive ion etching is used to remove the top layer of ZnO and expose the (111) photonic crystal surface. The resulting structures have high filling fractions, possess photonic band gaps in the near-UV to visible spectrum, and exhibit efficient photoluminescence.

Department(s)

Physics

Sponsor(s)

National Science Foundation (U.S.)

Keywords and Phrases

Atomic Layer Deposition; Photoluminescence; Photonic crystals

International Standard Serial Number (ISSN)

0003-6951

Document Type

Article - Journal

Document Version

Final Version

File Type

text

Language(s)

English

Rights

© 2005 Institute of Physics - IOP Publishing, All rights reserved.

Included in

Physics Commons

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