Title

Mask-Based Microsphere Photolithography

Abstract

Microsphere Photolithography (MPL) uses a self-assembled array of transparent microspheres to focus incident ultraviolet radiation and produce an array of photonic jets in photoresist. Typically, the microspheres are self-assembled directly on the photoresist layer and are removed after exposure during development. Reusing the microsphere array reduces the expense of the process. A mask is formed by transferring the self-assembled microsphere array to a transparent tape. This can be used for multiple exposures when pressed into contact with the photoresist. This paper demonstrates the use of this process to pattern infrared metasurface absorbers and discusses the effects of the mask-based MPL process on the metasurface performance.

Meeting Name

ASME 2018 13th International Manufacturing Science and Engineering Conference, MSEC 2018 (2018: Jun. 18-22, College Station, TX)

Department(s)

Mechanical and Aerospace Engineering

Keywords and Phrases

Manufacture; Photoresists; Metasurface; Micro/nano fabrications; Microsphere arrays; Multiple exposure; Photoresist layers; Self-assembled arrays; Self-assembled microspheres; Microspheres; Mask-based; Micro/nano fabrication process; Microsphere photolithography

International Standard Book Number (ISBN)

978-0-7918-5138-8

Document Type

Article - Conference proceedings

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2018 American Society of Mechanical Engineers (ASME), All rights reserved.

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