"Atomic Layer Deposition is a robust technique used to deposit high quality, conformal, and size-tunable ultrathin films on a substrate. This technique can be used to coat protective films on battery anode and cathode materials for enhanced performance. In the case of cathodes, the ultrathin film provides a protective barrier preventing cationic dissolution. In the case of anodes, the film acts as a supporting matrix reducing strain caused by volume expansions. In these study, we use this technique to coat an optimally thick conductive iron oxide film on tin oxide particles to improve its electrochemical performance at high current densities when tested in a practical voltage window. The conductive nature of the iron oxide film enabled faster kinetics at the interface for Li+ transfer that enabled improved performance"--Abstract, page iv.
Chemical and Biochemical Engineering
M.S. in Chemical Engineering
National Science Foundation (U.S.)
Missouri University of Science and Technology
Journal article titles appearing in thesis/dissertation
- Enhanced cycle life and capacity retention of iron oxide ultrathin film coated SnO2 nanoparticles at high current densities
x, 46 pages
© Sai Abhishek Palaparty
Thesis - Open Access
Library of Congress Subject Headings
Atomic layer deposition
Lithium ion batteries
Electronic OCLC #
Palaparty, Sai Abhishek, "Surface modification of tin oxide nanoparticles by atomic layer deposition for enhanced electrochemical performance" (2016). Masters Theses. 7613.