Microstrip structures, formed by metal traces printed on a dielectric substrate above a reference plane, are frequently the object of electromagnetic modeling. In this paper, hybrid FEM/MoM formulations employing conventional Whitney elements and newly developed linear-tangent/linear-normal (LT/LN) tangential vector finite elements (TVFEs) are applied to the analysis of microstrip structures with thin traces. This paper shows that the variation of the electric field below the trace is a significant issue to be addressed in microstrip structure modeling. Different mesh methods are investigated and the advantages of the LT/LN TVFEs are discussed.
H. Wang et al., "Application of Higher-Order FEM Elements to the Analysis of Microstrip Structures," Proceedings of the IEEE International Symposium on Electromagnetic Compatibility, 2002, Institute of Electrical and Electronics Engineers (IEEE), Jan 2002.
The definitive version is available at http://dx.doi.org/10.1109/ISEMC.2002.1032835
IEEE International Symposium on Electromagnetic Compatibility, 2002
Electrical and Computer Engineering
Keywords and Phrases
Whitney Elements; Dielectric Substrate; Electromagnetic Modeling; Finite Element Analysis; Higher-Order FEM Elements; Linear-Tangent/Linear-Normal Tangential Vector Finite Elements; Mesh Methods; Method of Moments; Microstrip Lines; Microstrip Structures Analysis; Substrates
Article - Conference proceedings
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