Abstract
This paper reports on dissociative electron attachment in F2, NF3, Cl2, and I2. The principle of the method is to produce a short burst of photoelectrons from a photocathode by means of light from an argon-fluoride laser. Subsequently, by studying the motion of electrons and negative ions in a constant electric field (E) region, information is obtained about drift velocities and effective attachment cross sections. Helium, argon, and nitrogen were used as buffer gases. Of particular interest is a very strong temperature dependence of the attachment coefficient in I2. Measurements were taken from 35 to 110°C, covering an E/N range of 1-50 Townsend. An explanation based on vibrational excitation is presented. Copyright © 1979 by The Institute of Electrical and Electronics Engineers, Inc.
Recommended Citation
K. J. Nygaard et al., "Negative Ion Production Rates In Rare Gas-Halide Lasers," IEEE Journal of Quantum Electronics, vol. 15, no. 11, pp. 1216 - 1223, Institute of Electrical and Electronics Engineers, Jan 1979.
The definitive version is available at https://doi.org/10.1109/JQE.1979.1069918
Department(s)
Physics
International Standard Serial Number (ISSN)
1558-1713; 0018-9197
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2023 Institute of Electrical and Electronics Engineers, All rights reserved.
Publication Date
01 Jan 1979
