Preparation of an Iron Nitride Film from a Molecular Tetrairon Nitrido Cluster

Abstract

The transition metal-main-group atom cluster HFe 4(CO) 12N has been studied as a potential molecular precursor for the production of thin films that contain amorphous iron nitride phases. Films 300-500 Å thick are formed by chemical vapor deposition at 160-180°C on glass substrates. Analysis by X-ray photoelectron spectroscopy shows ≈10% nitrogen and low oxygen and carbon impurities. X-ray diffraction shows the presence of an α-Fe phase. Mössbauer spectoscopy of the purest films confirms the presence of α-Fe and, in agreement with the atomic composition, shows an equally abundant nitride phase which is probably due to γ′-Fe 4N. Mass spectrometric analysis of the gas-phase products shows the presence of CO, which is the major gaseous product in the deposition, but low levels of H 2, NH 3, and CO 2 are also identified as pyrolysis products of HFe 4(CO) 12N. The iron nitride film appears to be very similar to that produced by reactive sputtering of iron in argon in the presence of N 2 and H 2 in a 1:1 ratio. © 1990 American Chemical Society.

Department(s)

Physics

Second Department

Chemistry

International Standard Serial Number (ISSN)

0897-4756

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 1990 American Chemical Society (ACS), All rights reserved.

Publication Date

01 Jan 1990

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