Deep Plasmonic Direct Writing Lithography with ENZ Metamaterials and Nanoantenna
Abstract
In this article, we demonstrate a specially designed resonant metamaterial with epsilon-near-zero (ENZ) and nanoantenna to enhance the exposure depth in plasmonic direct writing lithography more than 10 times. The ENZ metamaterial composed of a Ag/Si3N4 multilayer thin film, converts the evanescent field generated by the bowtie aperture nanoantenna to propagating waves with low divergence and high collimation. Deep sub-diffraction limited resolution of less than 65 nm (λ/7) with exposure depth greater than 100 nm is achieved. This work brings plasmonic direct writing lithography one step closer to practical applications.
Recommended Citation
H. Luo et al., "Deep Plasmonic Direct Writing Lithography with ENZ Metamaterials and Nanoantenna," Nanotechnology, vol. 30, no. 42, Institute of Physics Publishing, Aug 2019.
The definitive version is available at https://doi.org/10.1088/1361-6528/ab33f7
Department(s)
Mechanical and Aerospace Engineering
Research Center/Lab(s)
Center for Research in Energy and Environment (CREE)
Keywords and Phrases
Epsilon-Near-Zero Metamaterials; Nanoantenna; Plasmonic Direct Writing
International Standard Serial Number (ISSN)
0957-4484; 1361-6528
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2019 Institute of Physics Publishing, All rights reserved.
Publication Date
01 Aug 2019
PubMed ID
31328721
