Title

Deep Plasmonic Direct Writing Lithography with ENZ Metamaterials and Nanoantenna

Abstract

In this article, we demonstrate a specially designed resonant metamaterial with epsilon-near-zero (ENZ) and nanoantenna to enhance the exposure depth in plasmonic direct writing lithography more than 10 times. The ENZ metamaterial composed of a Ag/Si3N4 multilayer thin film, converts the evanescent field generated by the bowtie aperture nanoantenna to propagating waves with low divergence and high collimation. Deep sub-diffraction limited resolution of less than 65 nm (λ/7) with exposure depth greater than 100 nm is achieved. This work brings plasmonic direct writing lithography one step closer to practical applications.

Department(s)

Mechanical and Aerospace Engineering

Research Center/Lab(s)

Center for Research in Energy and Environment (CREE)

Keywords and Phrases

Epsilon-Near-Zero Metamaterials; Nanoantenna; Plasmonic Direct Writing

International Standard Serial Number (ISSN)

0957-4484; 1361-6528

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2019 Institute of Physics Publishing, All rights reserved.

Publication Date

01 Aug 2019

PubMed ID

31328721

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