Title

Deep Plasmonic Direct Writing Lithography with ENZ Metamaterials and Nanoantenna

Abstract

In this article, we demonstrate a specially designed resonant metamaterial with epsilon-near-zero (ENZ) and nanoantenna to enhance the exposure depth in plasmonic direct writing lithography more than 10 times. The ENZ metamaterial composed of a Ag/Si3N4 multilayer thin film, converts the evanescent field generated by the bowtie aperture nanoantenna to propagating waves with low divergence and high collimation. Deep sub-diffraction limited resolution of less than 65 nm (λ/7) with exposure depth greater than 100 nm is achieved. This work brings plasmonic direct writing lithography one step closer to practical applications.

Department(s)

Mechanical and Aerospace Engineering

Keywords and Phrases

Epsilon-Near-Zero Metamaterials; Nanoantenna; Plasmonic Direct Writing

International Standard Serial Number (ISSN)

0957-4484; 1361-6528

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2019 Institute of Physics Publishing, All rights reserved.

Publication Date

01 Aug 2019

PubMed ID

31328721

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