Feasibility Study of Single-Crystal Si Island Manufacturing by Microscale Printing of Nanoparticles and Laser Crystallization


Nonvacuum printing of single crystals would be ideal for high-performance functional device (such as electronics) fabrication yet challenging for most materials, especially for inorganic semiconductors. Currently, the printed films are dominant in amorphous, polycrystalline, or nanoparticle films. In this article, manufacturing of single-crystal silicon micro/nano-islands is attempted. Different from traditional vapor deposition for silicon thin-film preparation, silicon nanoparticle ink was aerosol-printed followed by confined laser melting and crystallization, allowing potential fabrication of single-crystal silicon micro/nano-islands. It is also shown that as-fabricated Si islands can be transfer-printed onto polymer substrates for potential application of flexible electronics. The additive nature of this technique suggests a scalable and economical approach for high-crystallinity semiconductor printing.


Mechanical and Aerospace Engineering

Research Center/Lab(s)

Intelligent Systems Center

Second Research Center/Lab

Center for Research in Energy and Environment (CREE)

Third Research Center/Lab

Center for High Performance Computing Research


The work is supported by the collaborative NSF grant CMMI-1363392 and 1363313 to C.G. and H.P. and NSF grant CMMI-1635256. This research was also partially supported by the Intelligent System Center (ISC) and the Material Research Center (MRC) at the Missouri University of Science and Technology and ORAU Ralph E. Powe Junior Faculty Enhancement Award.

Keywords and Phrases

Aerosol Printing; Confinement; Flexible Electronics; Laser Crystallization; Silicon Nanoparticle Ink

International Standard Serial Number (ISSN)

1944-8244; 1944-8252

Document Type

Article - Journal

Document Version


File Type





© 2019 American Chemical Society (ACS), All rights reserved.

Publication Date

01 Sep 2019

PubMed ID